Focused Ion Beam Nanofabrication (FIB) complements the overall nanofabrication process by providing various direct patterning or masking techniques. Direct milling, etching or deposition helps to simplify the nanofabrication process and minimize process development efforts. Resistless hard masking, ion implantation, and surface functionalization can be used for selectively modifying a material or directing a subsequent processing step, besides standard resist lithography. This workshop introduces to the various applications of FIB.
Martedì 12 Marzo 2019 ore 15.30
Dott. Andrea Notargiacomo (CNR-IFN)